JPH0115120Y2 - - Google Patents
Info
- Publication number
- JPH0115120Y2 JPH0115120Y2 JP9689283U JP9689283U JPH0115120Y2 JP H0115120 Y2 JPH0115120 Y2 JP H0115120Y2 JP 9689283 U JP9689283 U JP 9689283U JP 9689283 U JP9689283 U JP 9689283U JP H0115120 Y2 JPH0115120 Y2 JP H0115120Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- cathode
- hollow cathode
- hollow
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Gas-Filled Discharge Tubes (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9689283U JPS605100U (ja) | 1983-06-23 | 1983-06-23 | ホロ−カソ−ド放電型プラズマ発生装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9689283U JPS605100U (ja) | 1983-06-23 | 1983-06-23 | ホロ−カソ−ド放電型プラズマ発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS605100U JPS605100U (ja) | 1985-01-14 |
JPH0115120Y2 true JPH0115120Y2 (en]) | 1989-05-08 |
Family
ID=30230714
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9689283U Granted JPS605100U (ja) | 1983-06-23 | 1983-06-23 | ホロ−カソ−ド放電型プラズマ発生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS605100U (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6030867B2 (ja) * | 2011-06-24 | 2016-11-24 | 国立大学法人佐賀大学 | プラズマ処理装置 |
-
1983
- 1983-06-23 JP JP9689283U patent/JPS605100U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS605100U (ja) | 1985-01-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6878234B2 (en) | Plasma processing device and exhaust ring | |
JP2004200345A (ja) | プラズマ処理装置 | |
US5716484A (en) | Contaminant reduction improvements for plasma etch chambers | |
US3786268A (en) | Electron gun device of field emission type | |
JPH0115120Y2 (en]) | ||
JPS62199767A (ja) | イオンプレ−テイング装置 | |
US20030234372A1 (en) | Ion source of an ion implantation apparatus | |
JPS57131373A (en) | Plasma etching device | |
JPH0766760B2 (ja) | 収束性高速原子線源 | |
JP2862088B2 (ja) | プラズマ発生装置 | |
JP2603104Y2 (ja) | プラズマ発生装置 | |
JPH0222500B2 (en]) | ||
JPS6314369Y2 (en]) | ||
JP3079789B2 (ja) | プラズマ銃及びプラズマ発生装置 | |
JPH0241584B2 (en]) | ||
JPS6360300U (en]) | ||
JPH0372068A (ja) | 固体イオン源 | |
JPH09143708A (ja) | スパッタリング装置のターゲット | |
JPH0458445A (ja) | 電子ビーム源 | |
JPS6311560U (en]) | ||
JPH0444363U (en]) | ||
JPH043056B2 (en]) | ||
JPH0192360A (ja) | ホロ−カソ−ド型イオン源 | |
JPH0192362A (ja) | 分子流発生装置 | |
JPH06116719A (ja) | 高周波イオンプレーティング装置 |